If offers customizable ion beam milling equipment according to customer requirements.
Product lineup
Ion Milling System
Ion Beam Milling System
- 10IBE (10cm Ion Source)
Ion Beam Miling for Research System Small foot print
- 8cm or 10cm Kaufman Type Ion Source
- Substrate size: 4inch Dia. X 1sheet
- Single Stage and Direct cooling Stage
- 20IBE-C (20cm Ion Source)
Ion Beam Milling System for production
- 20cm Kaufman type Ion Source
- Substrate size:
3inch Dia. X 8sheets
4inch Dia. X 6sheets
6inch Dia. X 4sheets - Planetary Stage
- Excellent uniformity by planetary movement
- 20IBE-J (20cm Ion Source)
Large Ion Beam Milling System
- 20cm Kaufman Type Ion Source
- Substrate size:
4inch Dia X 12sheets
5inch Dia X 10sheets
6 inch Dia X 8sheets - Planetary Stage
- Excellent uniformity by planetary movement
Overview of Hakuto (NS)
Hakuto (NS) JAPAN
NS has produced both small batch typeAs research and large batch type as Production. Ion Milling System is optimal etching technology for Magnetic materials, Gold, Platinum and Alloyed metals. It is very easy to do milling of many kinds of materials. Main application *Thin film Magnetic Head *Spintronics *MR Sencer *MEMS *RF Devices *Optical Component *Super Conductivity
Inquiry on the products
Reception hours: Weekdays 9:00-17:30
(excluding Saturdays, Sundays, holidays, and company-designated holidays)