Hakuto (NS) / JAPAN

Details
Hakuto(NS)

NS has produced both small batch typeAs research and large batch type as Production. Ion Milling System is optimal etching technology for Magnetic materials, Gold, Platinum and Alloyed metals. It is very easy to do milling of many kinds of materials. Main application *Thin film Magnetic Head *Spintronics *MR Sencer *MEMS *RF Devices *Optical Component *Super Conductivity

Product Lineup

Ion Milling System

Ion Beam Milling System

 

10IBE (10cm Ion Source)

Ion Beam Miling for Research System Small foot print

  • 8cm or 10cm Kaufman Type Ion Source
  • Substrate size: 4inch Dia. X 1sheet
  • Single Stage and Direct cooling Stage

 

20IBE-C (20cm Ion Source)

Ion Beam Milling System for production

  • 20cm Kaufman type Ion Source
  • Substrate size:
    3inch Dia. X 8sheets
    4inch Dia. X 6sheets
    6inch Dia. X 4sheets
  • Planetary Stage
  • Excellent uniformity by planetary movement

 

20IBE-J (20cm Ion Source)

Large Ion Beam Milling System

  • 20cm Kaufman Type Ion Source
  • Substrate size:
    4inch Dia X 12sheets
    5inch Dia X 10sheets
    6 inch Dia X 8sheets
  • Planetary Stage
  • Excellent uniformity by planetary movement
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Telephone contact: 81-3-3225-8073