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02/01/2008

Exhibition Information of nano tech2008

Place: Tokyo Big Sight
Date: 2/13-2/15
On Display:
・Molecular Imprints: UV type Nano Imprinting System
・Vistec Lithography: Electron Beam Lithography System
・Raith: Electron Beam Lithography System
・NanoInk: Dip Pen Nanolithography System
・Plustek: ICP Etcher
・Hakuto: Ion Milling System
・KRI: End Hall Ion Source
・SII Nano Technology: Focused Ion Beam System, Scanning Probe Microscope and Scanning Electron Microscope
・Hakuto (Chemical Business Div.) : Polyester Dendrimer and HAKUPHOTOMER series

URL: http://www.ics-inc.co.jp/nanotech/en/index.html